We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for DLC film deposition equipment.
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DLC film deposition equipment - List of Manufacturers, Suppliers, Companies and Products

DLC film deposition equipment Product List

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DLC film deposition device "Plasma Ion Injection Film Deposition Device"

3D, large-scale, low-temperature processing possible! Plasma ion implantation film deposition device using proprietary development technology.

The "Plasma Ion Injection Film Deposition Device" employs proprietary technology and is a DLC film deposition device capable of three-dimensional, large-scale, and low-temperature processing. It is a uniquely developed device by Kurita Seisakusho and has obtained a patent (Patent No. 3555928). By supplying the output of the pulse RF power source for plasma generation and the high-voltage pulse power source for ion injection from a single electrode, it enables plasma generation tailored to the substrate shape. DLC coating and gas ion injection processing can be performed with this single device. 【Features】 - Capable of three-dimensional shape film deposition - Can accommodate larger devices - Capable of low-temperature processing - Fully automated operation - Reliable log function For more details, please contact us or download the catalog.

  • Plasma surface treatment equipment

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Corrosion resistance measures using DLC <STD-DLC>

We will deposit a DLC with excellent corrosion resistance and almost no pinholes using a thick film.

Our method allows for the deposition of DLC with low internal stress. As a result, thick DLC films can be deposited, which are resistant to most acids and alkalis. We can also deposit on complex shapes and the inner surfaces of pipes, which is difficult for other companies.

  • Surface treatment contract service

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DLC (Diamond-Like Carbon) Film Deposition Device

For medical applications and optical components! Plasma CVD equipment that can reduce initial and running costs.

The "Diamond-Like Carbon Film Deposition Device" is a thermal cathode PIG (Penning Ion Gauge Discharge Type) plasma CVD device. It enables processing at low temperatures and high vacuum, achieving the formation of DLC (Diamond-Like Carbon) films with excellent hardness and smoothness. Compared to other methods, it allows for independent control of the amount and energy of ions incident on the substrate, enabling extremely wide-ranging control of film quality. Additionally, Tosei Corporation also offers surface treatment processing that widely utilizes the excellent characteristics of diamond-like carbon films on materials such as cemented carbide, stainless steel, and tool steel. 【Features】 ■ Low friction coefficient ■ Wear resistance ■ Low aggressiveness ■ Non-welding ■ Insulating *For more details, please refer to the catalog or feel free to contact us.

  • Other contract services

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